Hard Mask Blank. A blank photomask made from highly polished flat glass or synthetic quartz substrate which is coated with a thin metal film (e.g. chromium) and a photoresist or electron-beam resist. The resist is sensitised by UV or electron-beam radiation in patterns relating to integrated circuit design. The photomask is used in the production of semiconductor devices.
Keywords
PLATES
COATED
FOR SEMICONDUCTOR PRODUCTION
POLISHED
PLATED WITH CHROMIUM
Justification
Classification has been determined in accordance with the following:
For the purposes of determining the commodity codes within which goods most appropriately fall, reg 3(1) of The Customs Tariff (Establishment) (EU Exit) Regulations 2020 sets out that the rules of interpretation contained in the following have effect - a. Part Two (Goods Classification Table Rules of Interpretation) of the Tariff of the United Kingdom (Reg 3(1)(a)); and b. Notes to a section or chapter of the goods Classification Table (Reg 3(1)(b)).
General interpretative rules (GIR)s:
GIR 1 has been used to classify this product by the terms of heading 3701 - photographic plates and film in the flat, sensitised, unexposed, of any material other than paper, paperboard or textiles; instant print film in the flat, sensitised, unexposed, whether or not in packs.
8 Digit Code: 37019900 - other than for colour photography (polychrome).
Also classified in accordance with:
HSENs to 3701.